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TEL Clean Track Act 8 single block 200 mm photoresist wafer track configured with two coaters and two developersThe TEL Clean Track Act 8 is the industry standard 200mm. CLEAN TRACK ACT 12 Coater Developer. For DUV lithography process steps with the TEL ACT-8 track CMi recommends to use wafers with the lowest possible total thickness variation TTV.

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